PHOTOSENSITIVE COMPOSITION

摘要

Provided is a photosensitive composition which ensures formation of a pattern with high sensitivity and excellent linearity and adhesiveness on a substrate, and is capable of preventing formation of under cut in the pattern after development even if the photosensitive composition contains a light-blocking agent or is short of an exposure amount. In addition, provided are a color filter and a display device using the composition. In terms of the photosensitive composition comprising a photopolymerizable compound and a photopolymerization initiator, a carbazole-3-monocarbonyl group having a specific substitution group on a number 6 position on a carbazole ring and an oxime-based compound on which a specifically structured cycloalkyl alkyl group is boned to a carbon atom on the oxime are used as the photo polymerization initiator.