| 发明名称 |
METHOD FOR MODELING A PHOTORESIST PROFILE |
| 摘要 |
A computer implemented method comprises a step of characterizing a photoresist profile by using a computer according to a magnitude of a gradient of an inhibitor concentration, which is arranged in photoresist. |
| 申请公布号 |
KR20160007434(A) |
申请公布日期 |
2016.01.20 |
| 申请号 |
KR20150098418 |
申请日期 |
2015.07.10 |
| 申请人 |
SYNOPSYS, INC. |
发明人 |
WU CHENG EN;WEI HAIQING;ZHANG QIAOLIN;SONG HUA |
| 分类号 |
G06F17/50;H01L21/027;H01L21/768 |
主分类号 |
G06F17/50 |
| 代理机构 |
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代理人 |
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