HEATER FOR HEAT TREATMENT OF SUBSTRATE AND SUBSTRATE HEAT TRETMENT APPARATUS USING IT

摘要

The present invention relates to a heater for heat-treating a substrate, and a substrate heat treatment apparatus using the same. The heater for heat-treating a substrate comprises: an outer tube; a plurality of heating wires provided inside the outer tube; and inner tubes surrounding the heating wires respectively, inside the outer tube. Accordingly, a heating rate is controlled by area of a substrate by comprising the heating wires, thereby uniformly heating the substrate. In addition, the heating wires can be easily insulated by comprising a plurality of inner tube bodies with the heating wire.