| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method and imprint device that can prevent occurrence of a pattern defect caused by the difference in wet-spreading of droplets of imprint resin in imprint processing.SOLUTION: An imprint method for transferring a fine uneven pattern onto imprint resin supplied discretely on a transfer target substrate according to an ink jetting method by using an imprint mold containing areas having at least two different types of surface shapes in a pattern area at the principal surface side of a substrate calculates the supply amount and number of droplets of imprint resin onto the transfer target substrate, determines a wet-spreading scheduled region of droplets when the pattern region is brought into contact with the droplets supplied onto the transfer target substrate, determines the supply position of the imprint resin on the basis of the number of the droplets and the wet-spreading scheduled region, supplies the imprint resin onto the transfer target substrate on the basis of the supply position, and brings the fine uneven pattern into contact with the droplets at a wet-spreading timing at which the droplets wets and spreads in the wet-spreading scheduled region. |
