发明名称 UNEVENNESS INSPECTION SYSTEM, UNEVENNESS INSPECTION METHOD, AND UNEVENNESS INSPECTION PROGRAM
摘要 An unevenness inspection system includes: an image pickup section configured to acquire a picked-up image of an inspection target; an image generation section configured to generate a color-unevenness inspection image and a luminance-unevenness inspection image, based on the picked-up image; a calculation section configured to use both of the color-unevenness inspection image and the luminance-unevenness inspection image to calculate an evaluation parameter; and an inspection section configured to use the calculated evaluation parameter to perform unevenness inspection. The image generation section performs image separation processing to separate a color component and a luminance component on the picked-up image, to generate a color-component image and a luminance-component image, and individually performs filter processing taking account of visual spatial frequency characteristics on the color-component image and the luminance-component image to respectively generate the color-unevenness inspection image and the luminance-unevenness inspection image, based on the filter-processed color-component image and the filter-processed luminance-component image. The calculation section calculates the evaluation parameter in consideration of unevenness visibility with respect to both of color and luminance.
申请公布号 US2016011121(A1) 申请公布日期 2016.01.14
申请号 US201414769384 申请日期 2014.02.18
申请人 SONY CORPORATION 发明人 TOMIOKA Satoshi
分类号 G01N21/88;H04N9/07 主分类号 G01N21/88
代理机构 代理人
主权项 1. An unevenness inspection system comprising: an image pickup section configured to acquire a picked-up image of an inspection target; an image generation section configured to generate a color-unevenness inspection image and a luminance-unevenness inspection image, based on the picked-up image; a calculation section configured to use both of the color-unevenness inspection image and the luminance-unevenness inspection image to calculate an evaluation parameter; and an inspection section configured to use the calculated evaluation parameter to perform unevenness inspection, wherein the image generation section performs image separation processing to separate a color component and a luminance component on the picked-up image, to generate a color-component image and a luminance-component image, and individually performs filter processing taking account of visual spatial frequency characteristics on the color-component image and the luminance-component image to respectively generate the color-unevenness inspection image and the luminance-unevenness inspection image, based on the filter-processed color-component image and the filter-processed luminance-component image, and the calculation section calculates the evaluation parameter in consideration of unevenness visibility with respect to both of color and luminance.
地址 Minato-ku, Tokyo JP