CONTINUOUS MASK PROCESSING APPARATUS

摘要

The present invention relates to a continuous mask processing apparatus. More particularly, the present invention relates to a continuous mask processing apparatus which can perform a deposition process performed on a mask to which a substrate is attached, and a cleaning process performed on the mask from which the substrate is detached in a successive process. Thereby, productivity can be improved by reducing process time. The number of masks used for a process can be minimized. Also, a deposition apparatus is separated from a cleaning apparatus. Thereby, it can be effectively reduced that the probability of pollution due to external pollution sources generated when a mask is supplied again to the deposition apparatus after the mask is cleaned by the cleaning apparatus.