发明名称 OPTICAL MEMBER AND ITS PRODUCTION METHOD
摘要 A first light-shied-coating formation step that forms a light shield coating only in a part of an area of a transparent-substrate in which a light shield coating is to be formed, a step that deposits an optical thin film including, as its outermost layer, a layer to be hydrothermally treated, which will become a fine uneven pattern coating by being hydrothermally treated, in an area in which an antireflection coating is to be formed, a second light-shield-coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light-shield-coating formation step, and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated are performed in this order.
申请公布号 US2015378058(A1) 申请公布日期 2015.12.31
申请号 US201514850310 申请日期 2015.09.10
申请人 FUJIFILM Corporation 发明人 SONODA Shinichiro;YOSHIHIRO Tatsuya
分类号 G02B1/11;G02B1/12 主分类号 G02B1/11
代理机构 代理人
主权项 1. A method for producing an optical member in which an antireflection coating including a transparent fine uneven pattern coating that contains alumina hydrate, as a main component, is provided in an optically effective area on a surface of a transparent substrate, and in which a light shield coating is provided in an area including at least a boundary part, which is next to the optically effective area, in a non-effective area next to the optically effective area, the method performing in the following order: a first light shied coating formation step that forms the light shield coating only in a part of an area in which the light shield coating is to be formed; a step that deposits an optical thinfilm including, as its outermost layer, a layer to be hydrothermally treated, which will become the fine uneven pattern coating by being hydrothermally treated, in an area in which the antireflection coating is to be formed; a second light shield coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light shield coating formation step; and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated.
地址 Tokyo JP