发明名称 |
Supporting substrate for preparing semiconductor light-emitting device and semiconductor light-emitting device using supporting substrates |
摘要 |
A method may be provided for preparing a semiconductor light-emitting device. The method may include: preparing a first wafer in which a semiconductor multi-layered light-emitting structure is disposed on an upper part of an initial substrate; preparing a second wafer which is a supporting substrate; bonding the second wafer on an upper part of the first wafer; separating the initial substrate of the first wafer from a result of the bonding; and fabricating a single-chip by severing a result of the passivation. Other embodiments may be provided. |
申请公布号 |
US9224910(B2) |
申请公布日期 |
2015.12.29 |
申请号 |
US201414481993 |
申请日期 |
2014.09.10 |
申请人 |
LG Innotek Co., Ltd. |
发明人 |
Seong Tae Yeon |
分类号 |
H01L33/64;H01L33/48;H01L33/00;H01L33/40;H01L33/42;H01L33/60;H01L33/44 |
主分类号 |
H01L33/64 |
代理机构 |
KED & Associates LLP |
代理人 |
KED & Associates LLP |
主权项 |
1. A method for preparing a semiconductor light-emitting device, the method comprising:
preparing an initial substrate; preparing a light emitting structure include a first semiconductor layer, a second semiconductor layer, an active layer between the first semiconductor layer and the second semiconductor layer on the initial substrate; preparing a first structure that includes a second electrode layer disposed on the light-emitting structure, the first structure including the initial substrate, the light emitting structure and the second electrode structure; separately preparing a second structure that includes a selected supporting substrate and a heat sink layer on the selected supporting substrate; bonding the second structure that includes the heat-sink layer and the selected supporting substrate to the second electrode layer of the first structure; separating the initial substrate from a first side of the light-emitting structure; providing a temporary supporting substrate on the first side of the light-emitting structure; separating the selected supporting substrate from the heat sink layer; preparing a third supporting substrate on a portion of the heat sink layer exposed by separating the selected supporting substrate from the heat sink layer; and removing the temporary supporting substrate. |
地址 |
Seoul KR |