发明名称 Supporting substrate for preparing semiconductor light-emitting device and semiconductor light-emitting device using supporting substrates
摘要 A method may be provided for preparing a semiconductor light-emitting device. The method may include: preparing a first wafer in which a semiconductor multi-layered light-emitting structure is disposed on an upper part of an initial substrate; preparing a second wafer which is a supporting substrate; bonding the second wafer on an upper part of the first wafer; separating the initial substrate of the first wafer from a result of the bonding; and fabricating a single-chip by severing a result of the passivation. Other embodiments may be provided.
申请公布号 US9224910(B2) 申请公布日期 2015.12.29
申请号 US201414481993 申请日期 2014.09.10
申请人 LG Innotek Co., Ltd. 发明人 Seong Tae Yeon
分类号 H01L33/64;H01L33/48;H01L33/00;H01L33/40;H01L33/42;H01L33/60;H01L33/44 主分类号 H01L33/64
代理机构 KED & Associates LLP 代理人 KED & Associates LLP
主权项 1. A method for preparing a semiconductor light-emitting device, the method comprising: preparing an initial substrate; preparing a light emitting structure include a first semiconductor layer, a second semiconductor layer, an active layer between the first semiconductor layer and the second semiconductor layer on the initial substrate; preparing a first structure that includes a second electrode layer disposed on the light-emitting structure, the first structure including the initial substrate, the light emitting structure and the second electrode structure; separately preparing a second structure that includes a selected supporting substrate and a heat sink layer on the selected supporting substrate; bonding the second structure that includes the heat-sink layer and the selected supporting substrate to the second electrode layer of the first structure; separating the initial substrate from a first side of the light-emitting structure; providing a temporary supporting substrate on the first side of the light-emitting structure; separating the selected supporting substrate from the heat sink layer; preparing a third supporting substrate on a portion of the heat sink layer exposed by separating the selected supporting substrate from the heat sink layer; and removing the temporary supporting substrate.
地址 Seoul KR