| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor substrate cleaning device and a cleaning method which can correctly check cleanness of a semiconductor substrate surface. <P>SOLUTION: A semiconductor substrate cleaning device 100 comprises a cleaning part 1 cleaning a semiconductor substrate 10, a reflective sensor 2 measuring a reflection intensity of a surface of the semiconductor substrate 10 cleaned by the cleaning part 1, and a determination part 3 determining propriety of cleaning of the semiconductor substrate 10 based on the measurement result of the reflection intensity by the reflective sensor 2. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
