发明名称 MEMORY CELLS
摘要 Memory cells useful in phase change memory include a phase change material between first and second electrode and having a surface facing a surface of the second electrode. The second electrode comprises a plurality of portions of material, each portion having a respective distance from the surface of the phase change material and each portion having a respective resistivity. A portion of the plurality of portions of material farthest from the surface of the phase change material has a lowest resistivity and a portion of the plurality of portions of material closest to the surface of the phase change material has a highest resistivity. The resistivity of each individual portion is lower than the resistivity of each portion located closer to the surface of the phase change material, and higher than the resistivity of each portion located farther from the surface of the phase change material.
申请公布号 US2015372227(A1) 申请公布日期 2015.12.24
申请号 US201514840252 申请日期 2015.08.31
申请人 MICRON TECHNOLOGY, INC. 发明人 Liu Jun
分类号 H01L45/00;H01L27/24 主分类号 H01L45/00
代理机构 代理人
主权项 1. A memory cell, comprising: a first electrode having a surface; a second electrode having a surface facing the surface of the first electrode; and a phase change material between the first electrode and the second electrode and having a surface facing the surface of the second electrode; wherein the second electrode comprises a plurality of portions of material, each portion having a respective distance from the surface of the phase change material and each portion having a respective resistivity; wherein a portion of the plurality of portions of material farthest from the surface of the phase change material has a lowest resistivity of the plurality of portions of material and a portion of the plurality of portions of material closest to the surface of the phase change material has a highest resistivity of the plurality of portions of material; and wherein the resistivity of each individual portion is lower than the resistivity of each portion located closer to the surface of the phase change material, and higher than the resistivity of each portion located farther from the surface of the phase change material.
地址 Boise ID US