| 发明名称 |
SHADOW MASKS AND METHODS FOR THEIR PREPARATION AND USE |
| 摘要 |
A method of forming a shadow mask is provided. The method includes annealing at least one polymeric sheet to form at least one annealed polymeric sheet. The method also includes transferring a pattern from a primary mask to the annealed polymeric sheet using laser micromachining to form the shadow mask. |
| 申请公布号 |
US2015367452(A1) |
申请公布日期 |
2015.12.24 |
| 申请号 |
US201514737409 |
申请日期 |
2015.06.11 |
| 申请人 |
Indian Institute of Technology Kanpur |
发明人 |
Singh Govind Dayal;Subramaniam Anantha Ramakrishna |
| 分类号 |
B23K26/382;C23C14/34;B23K26/402;B29C71/02;C23C16/04;C23C14/04 |
主分类号 |
B23K26/382 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a shadow mask, the method comprising:
annealing at least one polymeric sheet to form at least one annealed polymeric sheet; and transferring a pattern from a primary mask to the annealed polymeric sheet using laser micromachining to form the shadow mask. |
| 地址 |
Kanpur IN |
