发明名称 Photosensitive composition, pattern-forming method using the composition, and resin used in the composition
摘要 A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
申请公布号 US9217919(B2) 申请公布日期 2015.12.22
申请号 US200913062285 申请日期 2009.08.26
申请人 FUJIFILM Corporation 发明人 Takahashi Hidenori;Tsuchimura Tomotaka;Tsuchihashi Toru;Yamashita Katsuhiro;Nishikawa Naoyuki
分类号 G03F7/004;C08F12/20;C08F12/22;C08F12/30;C08F12/32;G03F7/039;C09D125/18 主分类号 G03F7/004
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A resin comprising: at least one repeating unit (A) selected from repeating units represented by any one of the following general formulae (III) to (V); a repeating unit (B) represented by the following general formula (I); and a repeating unit (C) represented by the following general formula (VI): wherein each of R04, R05 and R07 to R09 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group; R06 represents a cyano group, a carboxyl group, —CO—OR25 or —CO—N(R26)(R27), and R26 and R27 may be bonded to each other to form a ring together with a nitrogen atom; each of X1 to X3 independently represents a single bond, an arylene group, an alkylene group, a cycloalkylene group, —O—, —SO2—, —CO—, —N(R33)— or a divalent linking group composed of a combination thereof; R25 represents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group; each of R26, R27 and R33 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group; and A represents an ionic structural site capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin, wherein the repeating unit represented by the formula (III) is a repeating unit represented by the following general formula (III-1) or (III-4): wherein in formulas (III-1) and (III-4) Ar1a represents an arylene group, R0l represents a hydrogen atom, a methyl group, a chloromethyl group, a trifluoromethyl group or a cyano group, R02 represents an alkylene group, a cycloalkylene group, —O—, —SO2—, —CO—, —N(R33)— or a divalent linking group composed of a combination thereof, R33 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group, and each of Ar2a to Ar4a represents an aryl group; wherein in formula (I) each of R01, R02 and R03 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, and R03 also may represent an alkylene group and be bonded to Ar1 to form a 5-membered ring or a 6-membered ring; Ar1 represents an aromatic ring group; each of n Ys independently represents a hydrogen atom or a group capable of leaving by the action of an acid, provided that at least one of Ys represents a group capable of leaving by the action of an acid; and n represents an integer of from 1 to 4, wherein Y in the general formula (I) is represented by the following general formula (II): wherein each of L1 and L2 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group; M represents a divalent linking group obtained by combining an alkylene group with —O—; Q represents an alkyl group, a cycloalkyl group, an alicyclic group which may contain a hetero atom, an aromatic ring group which may contain a hetero atom, an amino group, an ammonium group, a mercapto group, a cyano group or an aldehyde group; the group represented by -M-Q is a group constituted of from 5 to 20 carbon atoms; and at least two of Q, M and L1 may be bonded to each other to form a 5-membered ring or a 6-membered ring, and further provided that the repeating unit represented by the general formula (I) is selected from the group consisting of the following repeating units:  and wherein in formula (VI) each of R01, R02 and R03 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, and R03 also may represent an alkylene group and be bonded to Ar1 to form a 5-membered ring or a 6-membered ring; Ar1 represents an aromatic ring group; and n represents an integer of from 1 to 4; wherein a content of a group capable of decomposing by the action of an acid is expressed by a number (B) of a repeating unit having a group capable of decomposing by the action of an acid in the resin and a number (S) of a repeating unit having an alkali-soluble group which is not protected by a group capable of leaving by the action of an acid (B/(B+S)), and the content is from 0.05 to 0.40.
地址 Tokyo JP