发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the possibility that an output impedance becomes out of a range of a design value in adjustment of the output impedance using a transistor having a high-dielectric constant gate insulation film.SOLUTION: In a semiconductor device, conductive type transistors formed on a semiconductor substrate 100 and connected in parallel with each other have a plurality of same field effect transistors 12. Each of the plurality of field effect transistors 12 has a high-dielectric constant gate insulation film. The channel width of each of the plurality of field effect transistors 12 is 0.12 μm or more and 2.0 μm or less. High-dielectric constant gate insulation films 111 of each of the plurality of field effect transistors 12 are separated from each other.
申请公布号 JP2015230941(A) 申请公布日期 2015.12.21
申请号 JP20140115672 申请日期 2014.06.04
申请人 MICRON TECHNOLOGY INC 发明人 SAINO KANTA
分类号 H01L21/8234;H01L21/336;H01L21/8238;H01L27/088;H01L27/092;H01L29/78 主分类号 H01L21/8234
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