发明名称 MICROLENS ARRAY SUBSTRATE, METHOD FOR MANUFACTURING MICROLENS ARRAY SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a microlens array substrate capable of improving use efficiency of light and improving contrast, a method for manufacturing a microlens array substrate, an electro-optic device, and electronic equipment.SOLUTION: A microlens array substrate 10 includes: a substrate 11 having a surface 11a where a plurality of recesses 12 is disposed; and a lens layer 14 having an approximately flat surface 14a, which is disposed to cover the surface 11a and to bury the plurality of recesses 12. The lens layer 14 includes a lens layer 16, a lens layer 17, and a lens layer 18, sequentially layered from a surface side opposite to the surface 14a, following the shape of the recess 12, in which the refractive index of the lens layer 16 is larger than the refractive index of the lens layer 17, the refractive index of the lens layer 18 is smaller than the refractive index of the lens layer 17 and larger than the refractive index of the substrate 11; and on the surface 14a of the lens layer 14, the lens layer 18, the lens layer 17, and the lens layer 16 are sequentially exposed from the center to the end of the recess 12.
申请公布号 JP2015230427(A) 申请公布日期 2015.12.21
申请号 JP20140117366 申请日期 2014.06.06
申请人 SEIKO EPSON CORP 发明人 OZAWA NOBUHIKO
分类号 G02B3/00;F21S2/00;F21V5/04;G02F1/1333;G02F1/1335 主分类号 G02B3/00
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