发明名称 |
SEMICONDUCTOR MULTILAYER STRUCTURE AND METHOD FOR PRODUCING SAME |
摘要 |
This semiconductor multilayer structure comprises an n-type GaN layer and a p-type GaN layer which is formed on the n-type GaN layer and into which Mg ions are implanted. This semiconductor multilayer structure exhibits electroluminescence having a peak at a photon energy of 3.0 eV or more when a voltage is applied to the pn junction between the n-type GaN layer and the p-type GaN layer. |
申请公布号 |
WO2015190406(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
WO2015JP66313 |
申请日期 |
2015.06.05 |
申请人 |
SCIOCS COMPANY LIMITED |
发明人 |
KANEDA NAOKI;MISHIMA TOMOYOSHI;NAKAMURA TOHRU |
分类号 |
H01L33/32 |
主分类号 |
H01L33/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|