发明名称 SEMICONDUCTOR MULTILAYER STRUCTURE AND METHOD FOR PRODUCING SAME
摘要 This semiconductor multilayer structure comprises an n-type GaN layer and a p-type GaN layer which is formed on the n-type GaN layer and into which Mg ions are implanted. This semiconductor multilayer structure exhibits electroluminescence having a peak at a photon energy of 3.0 eV or more when a voltage is applied to the pn junction between the n-type GaN layer and the p-type GaN layer.
申请公布号 WO2015190406(A1) 申请公布日期 2015.12.17
申请号 WO2015JP66313 申请日期 2015.06.05
申请人 SCIOCS COMPANY LIMITED 发明人 KANEDA NAOKI;MISHIMA TOMOYOSHI;NAKAMURA TOHRU
分类号 H01L33/32 主分类号 H01L33/32
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