发明名称 |
WAFER HOLDING ROBOT END EFFECTER VERTICAL POSITION DETERMINATION IN ION IMPLANTER SYSTEM |
摘要 |
A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter. |
申请公布号 |
KR20100014709(A) |
申请公布日期 |
2010.02.10 |
申请号 |
KR20097020492 |
申请日期 |
2008.02.29 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
BLINNS BRANT S.;DANIELS KEVIN;POITRAS ROBERT A. |
分类号 |
H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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