发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To enhance alignment precision. <P>SOLUTION: The semiconductor device includes: a substrate 102; an alignment mark 110 formed on the substrate 102 and composed of a metal film; a cover insulating film 104 formed on the alignment mark 110 and covering an entire surface of the alignment mark 110; and a polyimide film 106 formed on the cover insulating film 104, and having an opening 108, which is opened on the alignment mark 110 and has an end face 108a aligning with an end face 110a of the alignment mark 110, in plan view. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010021293(A) 申请公布日期 2010.01.28
申请号 JP20080179562 申请日期 2008.07.09
申请人 NEC ELECTRONICS CORP 发明人 SHIMADA HIROTOSHI
分类号 H01L21/027;G03F9/00 主分类号 H01L21/027
代理机构 代理人
主权项
地址