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发明名称
Lithographischer Apparat, Vorrichtung für den Wechsel einer Fotomaske und Verfahren zur Herstellung einer Vorrichtung
摘要
申请公布号
DE602005013175(D1)
申请公布日期
2009.04.23
申请号
DE200560013175T
申请日期
2005.12.07
申请人
ASML NETHERLANDS B.V.
发明人
TEN KATE, NICOLAAS
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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