发明名称 |
DETECTION OF CONTAMINATION IN EUV SYSTEMS |
摘要 |
A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system. The first reflectivity change is larger than an average reflectivity change upon formation of a thicker contamination layer on the capping layer and larger than an average reflectivity change upon formation of an equal contamination on the actual mirrors of the optics of the system.
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申请公布号 |
US2009103069(A1) |
申请公布日期 |
2009.04.23 |
申请号 |
US20080236446 |
申请日期 |
2008.09.23 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW (IMEC) |
发明人 |
JONCKHEERE RIK;GOETHALS ANNE-MARIE;LORUSSO GIAN FRANCESCO;POLLENTIER IVAN |
分类号 |
G03B27/54;A61N5/00 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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