发明名称 PLASMA PROCESSING SYSTEM AND CONTROL METHOD THEREFOR
摘要 A plasma processing system and a control method are provided to enhance the progress throughput by overcoming the ignition failure although the error is generated in the plasma ignition. A cleaning process is initiated(S100). Whether the cooling water is normally provided or not is checked out(S110). The purifying gas is supplied and the inside of the plasma reactor is purified(S120). The basic pumping is made up to the fire pressure while the firing gas is supplied to the plasma reactor(S130). A controller initializes the value(n) to 1(S140). The controller controls the radio frequency generator and the plasma reactor, and the plasma ignition is attempted(S141). Whether the plasma ignition is normally performed or not in the plasma reactor is determined(S142). In case the plasma ignition is not normally comprised, the value(n) is increased(S144). The system controller is notified the fire error(S145). Normally, if the fire is made, the cleaning gas is supplied(S160). The washing of the chamber is made by the active gas(S170).
申请公布号 KR20090021690(A) 申请公布日期 2009.03.04
申请号 KR20070086410 申请日期 2007.08.28
申请人 NEW POWER PLASMA CO., LTD. 发明人 CHOI, DAI KYU
分类号 H01L21/205 主分类号 H01L21/205
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