| 摘要 |
A composition for forming an antireflective film is provided to suppress the generation of phase separation and the coagulation of coating, and to ensure excellent abrasion resistance, antifouling property, and chemical resistance. A composition for forming an antireflective film comprises a multi-functional photosensitive monomer, a photosensitive monomer having a double bond and branched carbon chain, a photopolymerization initiator and organic solvent. The photosensitive monomer having a double bond and branched carbon chain is acrylic acid alkylesters or methacrylic acid alkylesters. |
