| 摘要 |
PROBLEM TO BE SOLVED: To provide a fine nano imprinting mold enhanced in the peelability from an imprinting resin, hard to be stained by a resin, easy to remove a stain, excellent in durability and having high precision, and to provide its simple manufacturing method. SOLUTION: The nano imprinting mold 10 is constituted by providing an uneven pattern 17 on one main surface of a light pervious substrate 11. A first photocatalyst layer 12 is provided so as to cover one main surface of the light pervious substrate 11, and a second photocatalyst layer 15 is protruded on the first photocatalyst layer 12, so that the whole of the pattern shape part 16 having the uneven pattern 17 is constituted of a photocatalytic material. COPYRIGHT: (C)2008,JPO&INPIT
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