发明名称 COMPOSITION FOR INTERLAYER INSULATION FILM
摘要 PROBLEM TO BE SOLVED: To provide a composition for forming an interlayer insulation film, having good film characteristics such as permittivity, mechanical strengths, etc., used for an electronic device, also having a good close adhesion with a substrate plate, and further excellent in the stability of coating liquid. SOLUTION: This composition for the interlayer insulation film contains the following components. (A) A hydrolysate obtained by hydrolyzing an alkoxy silane or acyloxysilane having at least one carbon-carbon double bond under≤10 mass% substrate concentration. (B) A compound having at least two bonds selected from a carbon-carbon double bond and carbon-carbon triple bond in its molecule and (C) solvent. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008222742(A) 申请公布日期 2008.09.25
申请号 JP20070058857 申请日期 2007.03.08
申请人 FUJIFILM CORP 发明人 IWATO KAORU
分类号 C08L83/07;C08L45/00;C08L49/00;H01L21/312 主分类号 C08L83/07
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