发明名称 |
System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects |
摘要 |
A system for generating mask data includes an extracting module extracting a block necessary to correct process proximity effects as a wide correction area from a plurality of blocks by comparing parameter, a wide correction data generator generating wide correction data to make the correction applied to the wide correction area, and a mask data generator generating mask data by applying the wide correction data to the wide correction area.
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申请公布号 |
US7716628(B2) |
申请公布日期 |
2010.05.11 |
申请号 |
US20050298840 |
申请日期 |
2005.12.12 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TANAKA SATOSHI;FUKUHARA KAZUYA;KOTANI TOSHIYA |
分类号 |
G06F17/50;G03F1/36;G03F1/68;G03F1/70;G03F7/20;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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