| 摘要 |
PURPOSE: A device and a method for cleaning a deposition mask are provided to prevent a deposition agent from being re-attached on a deposition mask after cleaning, and to reduce damage to the deposition mask. CONSTITUTION: A device for cleaning a deposition mask is composed of a first separator(10), a suction unit(3), a second separator(6), a collecting unit(7), a refining unit, and a storage unit(9). The first separator separates a deposition agent from a deposition mask(2) by irradiating a pulse laser to the deposition mask. The suction unit inhales the separated deposition agent. The second separator separates the deposition agent from air. The collecting unit collects the deposition agent separated by the second separator. The refining unit refines the collected deposition agent. The storage unit stores the refined deposition agent.
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