发明名称 Photosensitive polyimide resin composition
摘要 The developability of a photosensitive polyimide resin composition with a weakly alkaline aqueous solution is improved without reduction in the solubility in general-purpose organic solvents even when a part of the diamine component is replaced with a diaminopolysiloxane-based compound or a bis(aminobenzoate)-based compound in order to reduce the warpage characteristics of the photosensitive polyimide resin composition by reducing its modulus of elasticity. The photosensitive polyimide resin composition is capable of being developed in a positive manner with a weakly alkaline aqueous solution and is soluble in an organic solvent. The photosensitive polyimide resin composition contains: a polyimide resin including a polyimide unit represented by formula (1) and a polyimide unit represented by one of formulas (2) and (3); an analogue of melamine cyanurate; and an analogue of diazonaphthoquinone. The amount of the analogue of melamine cyanurate is in the range of from 5 to 50 parts by weight with respect to 100 parts by weight of the polyimide resin.
申请公布号 US7592119(B2) 申请公布日期 2009.09.22
申请号 US20080226822 申请日期 2008.01.23
申请人 SONY CORPORATION;SONY CHEMICAL & INFORMATION DEVICE CORPORATION 发明人 NOMURA MAMIKO
分类号 G03F7/023;G03F7/30 主分类号 G03F7/023
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