| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method and a substrate processing device capable of carrying out a cleaning process well in a minimum time, and reducing working man-hours. SOLUTION: This photomask substrate processing device is provided with: a chamber 10 for housing a photomask substrate 11 therein; a processing liquid supply part 14 supplying sulfuric acid to the photomask substrate 11 in the chamber 10; a cleaning liquid supply part 15 supplying pure water to the photomask substrate 11 in the chamber 10; a measuring instrument 16 measuring the quantity of impurities included in a drainage fluid discharged from the chamber 10 in every predetermined period; and a control part 17 calculating the variation of the quantity of impurities from a relationship between the quantity of impurities measured by the measuring instrument 16 and a time, and stopping the supply of the pure water by the cleaning liquid supply part 15 based on the variation. COPYRIGHT: (C)2009,JPO&INPIT
|
