发明名称 Methods of Fabricating Silicon on Insulator (SOI) Wafers
摘要 Methods of fabricating SOI wafers are provided including providing a donor wafer and forming a hydrogen ion implantation layer in the donor wafer. A circumference portion of one side of the donor wafer is recessed to form a height difference. The one side of the donor wafer and a handle wafer are bonded to form a bonded wafer. The bonded wafer is heat treated to separate the bonded wafer along the hydrogen ion implantation layer.
申请公布号 US2009221133(A1) 申请公布日期 2009.09.03
申请号 US20090370783 申请日期 2009.02.13
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 CHOI SEUNG-WOO;BAE DAE-LOK;LEE JONG-WOOK;CHA YONG-WON;KANG PIL-KYU;KIM JUNG-HO
分类号 H01L21/762 主分类号 H01L21/762
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