| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition capable of forming a resist film having a refractive index of ≥1.72 at a wavelength of 193 nm and capable of patterning. <P>SOLUTION: The radiation-sensitive composition includes a polymer (A) including a repeating unit represented by general formula (1) (wherein R<SP>1</SP>denotes a hydrogen atom or a methyl group; R<SP>2</SP>-R<SP>4</SP>each denote a hydrogen atom, a 1-6C linear alkyl group or the like; R<SP>5</SP>-R<SP>10</SP>each denote a hydrogen atom, a 1-6C linear alkyl group or the like; and n is 0, 1 or 2) and a radiation-sensitive acid generator (B). <P>COPYRIGHT: (C)2009,JPO&INPIT |
