| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology which prevents an increase in time required for measurement advantageously even if the number of measurements is increased. <P>SOLUTION: An exposure system comprises a substrate stage 6 for holding a substrate 5, an alignment detection system 13 for detecting the position of a mark on the substrate in the first and second directions intersecting perpendicularly to each other in a plane which is perpendicular to the direction of the optical axis of a projection optical system 9, and a controller CNT for controlling the alignment detection system 13 to detect the position of the mark on the substrate while moving the substrate stage 6 substantially along the first direction, controlling the alignment detection system 13 to detect the position of the mark on the substrate while moving the substrate stage 6 substantially along the second direction, and controlling the positioning and the exposure of the substrate based on the detection results from the alignment detection system 13. <P>COPYRIGHT: (C)2009,JPO&INPIT |
