| 摘要 |
An exposure apparatus includes an original stage including a first mark, a substrate stage including a second mark and a photoelectric conversion device configured to detect light having passed through the second mark, a projection optical system, a measurement device configured to measure a position of at least one stage of the substrate stage and the original stage, and a controller configured to detect a positional relationship between the first mark and the second mark based on a signal output from the photoelectric conversion device and a measurement result output from the measurement device, wherein the controller cyclically samples a measurement result output from the measurement device, corrects the measurement result based on a time interval between a light emission timing of the pulsed light source and a sampling timing of the measurement result.
|
