| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a conductive base material capable of stably depositing a diamond-like carbon film containing metal elements at low cost. SOLUTION: The method includes: a simultaneously ionizing step of ionizing a raw material for vapor deposition by applying plasma-converted sublimation gas 25 to a raw material for vapor deposition containing metal elements, and ionizing hydrocarbon gas by bringing the hydrocarbon gas 36 into contact with the plasma-converted sublimation gas; and a film deposition step of depositing a diamond-like carbon film containing the metal elements by simultaneously depositing ions of the raw material for vapor deposition and ions of the hydrocarbon gas which are ionized in the simultaneously ionizing step on a base material. In the simultaneously ionizing step, ionization of the hydrocarbon gas is executed in a sublimation gas flow passage in which the plasma-converted sublimation gas is applied to the raw material for vapor deposition. COPYRIGHT: (C)2011,JPO&INPIT
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