| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film-forming apparatus, for which the area for installation is small, and the treatment time is short, and whose inside is scarcely contaminated. <P>SOLUTION: The film-forming apparatus includes a vacuum chamber 1 having an exhaust port 8 to which a pipeline 81 in communication with a vacuum pump P is connected; a stage 2 disposed at the lower portion of the vacuum chamber while having, as a bottom surface thereof, the wall surface of the vacuum chamber to which the exhaust port is formed, holding a substrate W, and enabling to cool the substrate; a raw material introducing means 4 which evaporates raw material organic molecules and introduces the evaporated molecules into the vacuum chamber; and a light irradiation means 3 disposed above the substrate while being opposed thereto and, after accumulation of the raw material organic molecules introduced into the vacuum chamber onto the surface of the substrate, irradiating the accumulated raw material organic molecules with light to cause polymerization reaction. The raw material introducing means has a ring-shaped shower head 43 surrounding the irradiation surface. A guide means 5 for introducing the raw material organic molecules ejected from the shower head onto the surface of the substrate is disposed. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
