发明名称 FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a field effect transistor which can generate two-dimensional electron gas with high efficiency, and exhibits a small resistance value of a contact resistance. SOLUTION: A spacer layer 13 of the field effect transistor 10 has a band gap larger than a band gap of a channel layer 12. A first electron supply layer 14 is set to have a composition in which an aluminum abundance ratio continuously increases as closer to one Z1 of thickness directions. A second electron supply layer 15 is set to have an aluminum abundance ratio equal to or higher than a maximum value of the aluminum abundance ratio of the first electron supply layer 14. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011138807(A) 申请公布日期 2011.07.14
申请号 JP20090295912 申请日期 2009.12.25
申请人 SHARP CORP 发明人 INNAMI KOSUKE;JON TOWAINAMU
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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