| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately performing exposure processing by satisfactorily retaining a liquid between a projection optical system and a substrate.SOLUTION: In the exposure device, an immersion area of a liquid LQ is formed between a projection optical system PL and a substrate P, and exposure of the substrate P is performed via the projection optical system PL and the liquid LQ in the immersion area. The exposure device includes: a nozzle member 70 which has at least one of a supply port 12 for supplying the liquid LQ and a recovery port 22 for recovering the liquid LQ; and a nozzle adjusting mechanism 80 which adjusts at least one of a position and a posture of the nozzle member 70 depending on a position or a posture of the substrate P. |
