| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a rinse agent composition to be used for producing a memory hard disk substrate on the surface of which there is no defect (no scratch and no pit) and on which no abrasive grain and no grinding swarf is left behind by preventing abrasive grains or grinding swarf to be produced by grinding work from being left behind or removing the remainders of the abrasive grains and the swarf, and to provide a method for producing the memory hard disk substrate by using the rinse agent composition. <P>SOLUTION: The rinse agent composition for the memory hard desk substrate contains water and hydrogen peroxide. The method for producing the memory hard desk substrate comprises a step of rinsing the memory hard desk substrate by using the rinse agent composition. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT</p> |
