发明名称 Aluminum Etchant
摘要 An aluminum etchant includes 3-30 wt % of hydrochloric acid, 4-20 wt % of sulfuric acid, 1-5 wt % of oxidizing agent, 0.5-2 wt % of surfactant, and water for the rest. The etchant can produce circuits of 200-25 μm wide on an aluminum foil or aluminum plate. The circuit has good quality. Therefore, the invention is suitable for miniaturized products that require higher precision.
申请公布号 US2013009090(A1) 申请公布日期 2013.01.10
申请号 US201213611594 申请日期 2012.09.12
申请人 SECURITAG ASSEMBLY GROUP CO., LTD.;WU CHUN-HAN;GAN TIEN-HUAT 发明人 WU CHUN-HAN;GAN TIEN-HUAT
分类号 C23F1/20 主分类号 C23F1/20
代理机构 代理人
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