| 摘要 |
The present invention provides a resin composition for an electrophotographic photoconductor having excellent image stability and abrasion resistance which comprises a polycarbonate resin and a polysiloxane group-containing A-B type block copolymer consisting of a polysiloxane group-containing copolymer segment-A formed by a vinyl monomer represented by the general formula (1) and a polysiloxane group-containing monomer and a polymersegment-B formed by a vinyl monomer represented by the general formula (1), wherein the content of said polysiloxane group-containing monomer is 10 to 85% by weight based upon said polysiloxane group-containing A-B type block copolymer, and the content of said polysiloxane group-containing A-B type block copolymer is 0.03 to 3 parts by weight based upon 100 parts by weight of said polycarbonate resin.
(In the formula (1), R 1 represents a hydrogen atom or a methyl group. R 2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, or a hydroxyalkyl group having 2 or 3 carbon atoms.) |
