SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition satisfying a focus margin (DOF) during production of a resist pattern.SOLUTION: A salt comprises an anion containing a group unstable to an acid and a group to cleave by the action of an alkali developing solution and an organic cation. An acid generator comprises the salt as an active ingredient. A resist composition comprises the acid generator and a resin in which the resin contains a group unstable to an acid, is insoluble or sparingly-soluble in an alkali aqueous solution and acts on an acid to be dissolved in the alkali aqueous solution.