发明名称 ALIGNING AND FOCUSING AN ELECTRON BEAM IN AN X-RAY SOURCE
摘要 A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
申请公布号 US2013301805(A1) 申请公布日期 2013.11.14
申请号 US201113884447 申请日期 2011.12.21
申请人 HEMBERG OSCAR;TUOHIMAA TOMI;SUNDMAN BJOERN;EXCILLUM AB 发明人 HEMBERG OSCAR;TUOHIMAA TOMI;SUNDMAN BJOERN
分类号 H05G1/52 主分类号 H05G1/52
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