发明名称
摘要 A substrate for a semiconductor device includes: a base substrate; a semiconductor layer that has a source region, a drain region, a plurality of channel regions, and at least one intermediate region; a source electrode being in contact with the source region; a drain electrode being in contact with the drain region; a gate electrode that overlaps the plurality of channel regions, the intermediate region, and each of a part of the source electrode and a part of the drain electrode; and a floating electrode being in contact with the intermediate region. The size of an area where the floating electrode and the gate electrode overlap each other is smaller than the sum of the size of an area where the source electrode and the gate electrode overlap each other and the size of an area where the drain electrode and the gate electrode overlap each other.
申请公布号 JP5521495(B2) 申请公布日期 2014.06.11
申请号 JP20090253223 申请日期 2009.11.04
申请人 发明人
分类号 H01L29/786;G02F1/167;H01L21/336 主分类号 H01L29/786
代理机构 代理人
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