| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing apparatus for improving a protruded distribution tendency of plasma density. <P>SOLUTION: A transmission system of the plasma processing apparatus is composed of a circular waveguide, an electromagnetic wave supply mechanism is made of a nearly cylindrical cavity connected to the circular waveguide, and a ridge 301 is provided at the cavity or the ridge 301 and a taper waveguide 401 are used in combination, thus improving a center concentration tendency of microwaves. <P>COPYRIGHT: (C)2011,JPO&INPIT |
