| 摘要 |
<p>The present invention relates to a method of manufacturing cerium oxide particles, cerium oxide particles thereby and polishing slurry comprising the same. The cerium oxide particles manufactured by the method of manufacturing cerium oxide particles of the present invention are able to easily control a crystalline structure, a shape, a size and the like by being synthesized under supercritical or subcritical conditions and are able to exhibit excellent polishing properties such as scratch and defect reduction and the like as compared with cerium oxide particles manufactured by a liquid phase method. Additionally, the cerium oxide particles have excellent crystallinity and high polishing rate as compared to cerium oxide particles manufactured by a solid phase method since density can be increased up to theoretical density without additional particle growth via heat treatment. Also, defects can be reduced since pulverization of particles is low, and the cerium oxide particles are uniform without fine powder generation in milling by reaction at a temperature lower than sintering temperature of the solid phase method.</p> |
