发明名称 |
NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTEGRATED CIRCUITS |
摘要 |
An apparatus for and methods of repairing and manufacturing integrated circuits using the apparatus. The apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate; an inspection and analysis probe; a heat source; a gas injector; and a gas manifold connecting multiple gas sources to the gas injector. |
申请公布号 |
US2015228548(A1) |
申请公布日期 |
2015.08.13 |
申请号 |
US201414179099 |
申请日期 |
2014.02.12 |
申请人 |
International Business Machines Corporation |
发明人 |
Adderly Shawn A.;Gambino Jeffrey P.;Joseph Eric A.;Speranza Anthony C. |
分类号 |
H01L21/66;H01L21/768;C23C16/30;H01J37/32;C23C16/00 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
1. An apparatus, comprising:
a vacuum chamber containing:
a movable stage configured to hold a substrate;an inspection and analysis probe;a heat source;a gas injector; and a gas manifold connecting multiple gas sources to said gas injector. |
地址 |
Armonk NY US |