发明名称 NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTEGRATED CIRCUITS
摘要 An apparatus for and methods of repairing and manufacturing integrated circuits using the apparatus. The apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate; an inspection and analysis probe; a heat source; a gas injector; and a gas manifold connecting multiple gas sources to the gas injector.
申请公布号 US2015228548(A1) 申请公布日期 2015.08.13
申请号 US201414179099 申请日期 2014.02.12
申请人 International Business Machines Corporation 发明人 Adderly Shawn A.;Gambino Jeffrey P.;Joseph Eric A.;Speranza Anthony C.
分类号 H01L21/66;H01L21/768;C23C16/30;H01J37/32;C23C16/00 主分类号 H01L21/66
代理机构 代理人
主权项 1. An apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate;an inspection and analysis probe;a heat source;a gas injector; and a gas manifold connecting multiple gas sources to said gas injector.
地址 Armonk NY US