发明名称 EXPOSURE APPARATUS, METHOD FOR ASSEMBLING THE SAME AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of improving safety.SOLUTION: An exposure apparatus for forming a pattern on a substrate by irradiation of an energy beam comprises: an exposure apparatus body including a plate stage for holding and moving the substrate; a chamber for surrounding the exposure apparatus body; and safety fences SR-SRarranged in the intermediate between the exposure apparatus body and the chamber so that an entering person in the chamber cannot contact with the exposure apparatus body. The safety fences SR-SRare formed so that the entering person can view the exposure apparatus body in operation through the safety fences SR-SR.
申请公布号 JP2015187752(A) 申请公布日期 2015.10.29
申请号 JP20150149603 申请日期 2015.07.29
申请人 NIKON CORP 发明人 KIKUCHI TAKAYUKI;KAWAI YUYA;KUWABARA TOMOHIRO
分类号 G03F7/22 主分类号 G03F7/22
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