| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a charged particle beam lithography method with excellent lithography time prediction property or high lithography precision by executing lithography preprocessing using a pseudo pattern of an identification code region. <P>SOLUTION: A charged particle beam lithography method includes: a step of inputting main lithography data in which a pattern to be drawn in a main region is defined to a charged particle beam lithography device; a step of generating pseudo identification code lithography data in which a pseudo pattern of the pattern to be drawn in an identification code region is defined; a lithography preprocessing step of using the main lithography data and the pseudo identification code lithography data to calculate shot density or pattern region density; a step of generating the identification code lithography data in which the pattern to be drawn in the identification code region is defined; a step of converting the main lithography data into first shot data; a step of drawing in the main region using the first shot data; a step of converting the identification code lithography data into second shot data; and a step of drawing in the identification code region using the second shot data. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
