发明名称 ANALYTICAL METHOD OF EXTREME SUPER-THIN GRAPHENE USING X-RAY
摘要 The present invention relates to an analytical method of graphene and, more specifically, relates to a method to examine a thickness (a number of layers) of graphene samples, the thickness of nanothin films, and a size of nanocrystal grains (average value, distribution, or the like) based on a technology used in a method to accurately measure and determine the thickness of a super thin graphene in units of atoms, molecules, and nanoparticles, which has remained as a difficult problem up until now and has allowed only by theoretical approach, and the data acquired thereof. The present invention provides an analytical method of graphene, which comprises: (a) a step of performing an XRD measurement of graphene defined by a number of layers (002) to acquire a diffraction peak; and (b) a step of deducing effective information on the thickness of graphene including a full width at half maximum (FWHM) and a distance between layers (d_002) from the peaks (002) by number of layers of graphene.
申请公布号 KR20150139432(A) 申请公布日期 2015.12.11
申请号 KR20150068883 申请日期 2015.05.18
申请人 KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY 发明人 HUH, SEUNG HUN
分类号 G01N23/00;G01N1/36;G01N1/44;G01N23/02;G01N23/20 主分类号 G01N23/00
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