发明名称 半導体装置の作製方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device including an oxide semiconductor with excellent electric characteristics. <P>SOLUTION: A semiconductor device comprises: an oxide semiconductor layer; a first region having conductivity on the oxide semiconductor layer; a source electrode on the first region; a second region having conductivity on the oxide semiconductor layer; a drain electrode on the second region; and a gate electrode on the oxide semiconductor layer. The gate electrode has a region overlapping with the first region, and has a region overlapping with the second region. <P>COPYRIGHT: (C)2013,JPO&INPIT</p>
申请公布号 JP5830045(B2) 申请公布日期 2015.12.09
申请号 JP20130033154 申请日期 2013.02.22
申请人 株式会社半導体エネルギー研究所 发明人 荒井 康行;本田 達也;秋元 健吾;川俣 郁子
分类号 H01L21/336;G02F1/1368;H01L29/786;H01L51/50;H05B33/14 主分类号 H01L21/336
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