发明名称 Micro-plasma generation using micro-springs
摘要 An ionic wind engine unit for cooling semiconductor circuit assemblies includes a curved micro-spring and an associated electrode that are maintained apart at an appropriate gap distance such that, when subjected to a sufficiently high voltage potential (i.e., as determined by Peek's Law), current crowding at the spring's tip portion creates an electrical field that sufficiently ionizes neutral molecules in a portion of the air-filled region surrounding the tip portion to generate a micro-plasma event. In one engine type the electrode is a metal pad, and in a second engine type the electrode is a second micro-spring. Ionic wind cooling is generated, for example, between an IC die and a base substrate in a flip-chip arrangement, by controlling multiple engines disposed on the facing surfaces to produce an air current in the air gap region separating the IC device and base substrate.
申请公布号 US9210785(B2) 申请公布日期 2015.12.08
申请号 US201313802569 申请日期 2013.03.13
申请人 Palo Alto Research Center Incorporated 发明人 Cheng Bowen;DeBruyker Dirk;Chow Eugene M.
分类号 F21V7/00;H05H1/24;H01T23/00;H05H1/48 主分类号 F21V7/00
代理机构 Bever, Hoffman & Harms, LLP 代理人 Bever, Hoffman & Harms, LLP
主权项 1. A system for generating a micro-plasma, the system comprising: a base substrate having a flat surface; a curved micro-spring including an anchor portion disposed parallel to the flat surface of the base substrate, a curved body portion having a first end integrally connected to the anchor portion and curved away from the flat base surface, and a tip portion integrally connected to a second end of the curved body portion, the anchor, body and tip portions comprising an electrically conductive material, wherein the tip portion is fixedly disposed in an air-filled region located above the flat surface; an electrode disposed on or above the flat surface adjacent to the tip portion of the micro-spring such that the tip portion is maintained at a fixed gap distance from the electrode; and a voltage supply coupled to the first electrode and to the anchor portion of the curved micro-spring, the voltage supply including means for generating a plasma-generating voltage across the fixed gap distance between the tip portion of the micro-spring and the electrode such that current crowding at the tip portion creates an electrical field that sufficiently ionizes neutral molecules in a portion of the air-filled region surrounding the tip portion to generate a micro-plasma, wherein the electrode comprises a second curved micro-spring attached to the flat surface of the base substrate adjacent to said curved micro-spring such the fixed gap distance is defined between said tip portion and a second body portion of said second micro-spring; and wherein said voltage supply comprises means for applying said plasma-generating voltage across the fixed gap distance between said micro-spring and the second micro-spring such that said micro-plasma is directed substantially parallel to the flat surface of the base substrate, further comprising a third curved micro-spring attached to the flat surface of the base substrate adjacent to said second curved micro-spring such the second micro-spring is disposed between said curved micro-spring and the third micro-spring, wherein said voltage supply comprises means for applying said plasma-generating voltage across the micro-spring and the second micro-spring during a first time period such that said micro-plasma is generated between the first and second micro-springs during the first time period, and for applying said plasma-generating voltage across the second micro-spring and the third micro-spring during a second time period such that a second micro-plasma is generated between the second and third micro-springs during a second time period.
地址 Palo Alto CA US
您可能感兴趣的专利