发明名称 |
Circuit element including a layer of a stress-creating material providing a variable stress and method for the formation thereof |
摘要 |
A transistor includes a source region, a drain region, a channel region, a gate electrode and a layer of a stress-creating material. The stress-creating material provides a stress that is variable in response to a signal acting on the stress-creating material. The layer of stress-creating material is arranged to provide a stress in at least the channel region. The stress provided in at least the channel region is variable in response to the signal acting on the stress-creating material. Layers of stress-creating material providing a stress that is variable in response to a signal acting on the stress-creating material may also be used in circuit elements other than transistors, for example, resistors. |
申请公布号 |
US9209174(B2) |
申请公布日期 |
2015.12.08 |
申请号 |
US201313768275 |
申请日期 |
2013.02.15 |
申请人 |
GLOBALFOUNDRIES Inc. |
发明人 |
von Kluge Johannes |
分类号 |
H01L29/78;H01L29/66;H01L27/088;G05F3/02;H01L21/66;H03K19/20;H01L49/02;H01L29/8605;H03K19/017;H01L21/8238;H01L27/092 |
主分类号 |
H01L29/78 |
代理机构 |
Amerson Law Firm, PLLC |
代理人 |
Amerson Law Firm, PLLC |
主权项 |
1. A circuit element, comprising:
a semiconductor region; and a layer of a stress-creating material, said stress-creating material providing a stress that is variable in response to a signal acting on said stress-creating material; wherein said layer of stress-creating material is arranged to provide a stress in said semiconductor region, said stress provided in said semiconductor region being variable in response to said signal acting on said stress-creating material. |
地址 |
Grand Cayman KY |