发明名称 Circuit element including a layer of a stress-creating material providing a variable stress and method for the formation thereof
摘要 A transistor includes a source region, a drain region, a channel region, a gate electrode and a layer of a stress-creating material. The stress-creating material provides a stress that is variable in response to a signal acting on the stress-creating material. The layer of stress-creating material is arranged to provide a stress in at least the channel region. The stress provided in at least the channel region is variable in response to the signal acting on the stress-creating material. Layers of stress-creating material providing a stress that is variable in response to a signal acting on the stress-creating material may also be used in circuit elements other than transistors, for example, resistors.
申请公布号 US9209174(B2) 申请公布日期 2015.12.08
申请号 US201313768275 申请日期 2013.02.15
申请人 GLOBALFOUNDRIES Inc. 发明人 von Kluge Johannes
分类号 H01L29/78;H01L29/66;H01L27/088;G05F3/02;H01L21/66;H03K19/20;H01L49/02;H01L29/8605;H03K19/017;H01L21/8238;H01L27/092 主分类号 H01L29/78
代理机构 Amerson Law Firm, PLLC 代理人 Amerson Law Firm, PLLC
主权项 1. A circuit element, comprising: a semiconductor region; and a layer of a stress-creating material, said stress-creating material providing a stress that is variable in response to a signal acting on said stress-creating material; wherein said layer of stress-creating material is arranged to provide a stress in said semiconductor region, said stress provided in said semiconductor region being variable in response to said signal acting on said stress-creating material.
地址 Grand Cayman KY